Roles of Transients and Nucleation in Film Deposition within a Support
- 8 March 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Industrial & Engineering Chemistry Research
- Vol. 42 (7), 1321-1328
- https://doi.org/10.1021/ie020879m
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Reactive Deposition of Metal Thin Films within Porous Supports from Supercritical FluidsChemistry of Materials, 2001
- Modeling of SiO2 deposition in porous Vycor: Effects of pore network connectivityAIChE Journal, 1997
- Multicomponent Mass Transport in Chemical Vapor InfiltrationIndustrial & Engineering Chemistry Research, 1996
- CVD of solid oxides in porous media for ceramic membrane preparation or modification. Explicit solutions for deposition characteristicsChemical Engineering Science, 1994
- Chemical Vapor Deposition of Solid Oxides in Porous Media for Ceramic Membrane Preparation. Comparison of Experimental Results with Semianalytical SolutionsIndustrial & Engineering Chemistry Research, 1994
- A kinetic model of membrane formation by CVD of SiO2 and Al2O3AIChE Journal, 1992
- CVD of solid oxides in porous substrates for ceramic membrane modificationAIChE Journal, 1992
- Modelling and analysis of CVD processes in porous media for ceramic composite preparationChemical Engineering Science, 1991
- Synthesis of hydrogen permselective silicon dioxide, titanium dioxide, aluminum oxide, and boron oxide membranes from the chloride precursorsIndustrial & Engineering Chemistry Research, 1991
- A random capillary model with application to char gasification at chemically controlled ratesAIChE Journal, 1980