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Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
Home
Publications
Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
AA
A. A. Ayón
A. A. Ayón
RB
R. Braff
R. Braff
CL
C. C. Lin
C. C. Lin
HS
H. H. Sawin
H. H. Sawin
MS
M. A. Schmidt
M. A. Schmidt
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1 January 1999
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 146
(1)
,
339-349
https://doi.org/10.1149/1.1391611
Abstract
No abstract available
Cited by 312 articles