Multi-level exposures and 3-D X-ray patterning for high-aspect ratio microstructures
- 31 March 1998
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 41-42, 493-496
- https://doi.org/10.1016/s0167-9317(98)00115-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- X-ray lathe: An X-ray lithographic exposure tool for nonplanar objectsJournal of Microelectromechanical Systems, 1996
- Deep x-ray lithography for micromechanics and precision engineering (invited)Review of Scientific Instruments, 1996
- Precision machining using hard X-raysSynchrotron Radiation News, 1994