Low-temperature deposition of ultrafine rutile TiO2 thin films by the hydrothermal method
- 16 August 1996
- journal article
- research article
- Published by Wiley in physica status solidi (a)
- Vol. 156 (2), 381-385
- https://doi.org/10.1002/pssa.2211560216
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Deposition of TiO2 Films by Reactive Sputtering in Magnetic FieldJapanese Journal of Applied Physics, 1991
- Kinetic and Thermodynamic Properties of Nanocrystalline MaterialsMRS Proceedings, 1989
- Processing and Properties of Nanophase OxidesMRS Proceedings, 1989
- Synthesis, Characterization, and Properties of Nanophase CeramicsMRS Proceedings, 1988
- The surfaces of metal oxidesReports on Progress in Physics, 1985
- Effects of oxygen in ion-beam sputter deposition of titanium oxidesJournal of Vacuum Science & Technology A, 1984
- Ion-assisted deposition of optical thin films: low energy vs high energy bombardmentApplied Optics, 1984
- Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phasesApplied Optics, 1976
- Metallic oxidesProgress in Solid State Chemistry, 1971
- Properties of Rutile (Titanium Dioxide)Reviews of Modern Physics, 1959