Magnetron dc reactive sputtering of TiN and ITO are sensitive to the design and operating parameters of the magnetron. Plasma confinement, current density, voltage, water cooling of the target, and the ratio of argon to the reactive gas are the important operating parameters. The TiN and ITO film composition was examined by x-ray diffraction. TiN fractional cross sections were examined by a SEM to determine film microstructure. The TiN films were thick enough to show a transition structure consisting of densely packed fibrous grains. The ITO films were too thin to show any structure.