Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy

Abstract

Ion energy, controlled by the substrate bias, is an important parameter in determining properties of films deposited by the filtered cathodic vacuum arc technique. The substrate bias determines the ion energy distribution of the growth species. The ion energy is varied, while keeping the other deposition conditions constant, in order to study the effect of ion energy on the film properties. The films were characterized by their optical and mechanical parameters using an ellipsometer, surface profilometer, optical spectrometer, and nanoindenter. Electron energy‐loss spectroscopy and Raman spectroscopy were used for structural analysis of the films.