Adsorption of Cationic Surfactants onto Photoresist Surfaces-A Way to Reduce Pattern Collapse in High Aspect Ratio Patterning
- 19 May 2008
- journal article
- research article
- Published by Wiley in The Canadian Journal of Chemical Engineering
- Vol. 84 (1), 3-9
- https://doi.org/10.1002/cjce.5450840102
Abstract
No abstract availableKeywords
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