Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture (H2SO4/H2O2) by HF Addition
- 1 April 1996
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 35 (4R)
- https://doi.org/10.1143/jjap.35.1989
Abstract
We report on the improvement in efficiency of deionized water rinsing after using a H2SO4/H2O2/HF mixture which produces hydrophobic Si surfaces by means of fluorine passivation, providing better sulfur removal and shorter rinsing time than the conventional H2SO4/H2O2 mixture. After removing this passivation agent by rinsing in deionized water, the surfaces are still covered with chemical oxide, which protects them from organic contamination. Furthermore this treatment does not induce surface roughening.Keywords
This publication has 2 references indexed in Scilit:
- Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluoro‐Trialkoxy‐Silane Group and Pure Water as Gas SourcesJournal of the Electrochemical Society, 1993
- Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopyApplied Physics A, 1986