Thickness dependence of structural, electrical and optical properties of indium tin oxide (ITO) films deposited on PET substrates
- 1 March 2008
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 254 (11), 3504-3508
- https://doi.org/10.1016/j.apsusc.2007.11.063
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Surface treatment and characterization of ITO thin films using atmospheric pressure plasma for organic light emitting diodesJournal of Colloid and Interface Science, 2007
- Electrical and optical characteristics of polymer light-emitting devices with surface-treated indium-tin-oxide electrodesMicroelectronics Journal, 2007
- Properties of indium tin oxide films deposited using High Target Utilisation SputteringThin Solid Films, 2007
- Enhanced performance of the OLED with plasma treated ITO and plasma polymerized thiophene buffer layerCurrent Applied Physics, 2006
- Preparation of high quality ITO films on a plastic substrate using RF magnetron sputteringSurface and Coatings Technology, 2006
- Preparation of TiO2/ITO and TiO2/Ti photoelectrodes by magnetron sputtering for photocatalytic applicationApplied Catalysis A: General, 2006
- High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systemsScience and Technology of Advanced Materials, 2006
- The effect of ITO films thickness on the properties of flexible organic light emitting diodeOptics Communications, 2005
- Effects of bias voltage on the properties of ITO films prepared on polymer substratesThin Solid Films, 2005
- Thickness dependence of In2O3:Sn film growthThin Solid Films, 2004