Silicon-based, protective transparent multilayer coatings deposited at high rate on optical polymers by dual-mode MW/r.f. PECVD
- 1 December 1993
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 236 (1-2), 58-63
- https://doi.org/10.1016/0040-6090(93)90642-3
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Investigation of the adhesion mechanisms of silicon alloy thin films on polymer substrates by IR ellipsometryThin Solid Films, 1993
- Improvement of adhesion between Si3N4 thin films and polycarbonate substrates by preparation of an interpenetrating layer using microwave plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Atomic microstructure and electronic properties of a-SiNx:H deposited by PECVDJournal of Non-Crystalline Solids, 1991
- On the structure of low-temperature PECVD silicon dioxide filmsJournal of Electronic Materials, 1990
- Properties of Si-rich SiNx:H films prepared by plasma-enhanced chemical vapor depositionJournal of Applied Physics, 1988
- Optical properties of plasma-enhanced chemical vapor deposited silicon-oxynitride filmsJournal of Applied Physics, 1987
- Plasma Deposition and Characterization of Thin Silicon‐Rich Silicon Nitride FilmsJournal of the Electrochemical Society, 1987
- Ion-based methods for optical thin film depositionJournal of Materials Science, 1986
- Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride LayersJournal of the Electrochemical Society, 1985
- Determination of optical constants of thin film coating materials based on inverse synthesisApplied Optics, 1983