Anionic surfactants for defect suppression in 193-nm lithography—Study of the adsorption process by ellipsometry and streaming potential measurements
- 20 November 2010
- journal article
- Published by Elsevier BV in Colloids and Surfaces A: Physicochemical and Engineering Aspects
- Vol. 371 (1-3), 8-13
- https://doi.org/10.1016/j.colsurfa.2010.08.043
Abstract
No abstract availableKeywords
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