Structures and properties of a Ta2O5 thin film deposited by dc magnetron reactive sputtering in a pure O2 atmosphere
- 1 January 1990
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 41 (4-6), 1204-1206
- https://doi.org/10.1016/0042-207x(90)93911-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The Suitability of Ta2O5 as a Solid State Ion-Sensitive MembraneJapanese Journal of Applied Physics, 1987
- Influence of SiO2 at the Ta2O5/Si interface on dielectric characteristics of Ta2O5 capacitorsJournal of Applied Physics, 1987
- New piezoelectric Ta2O5 thin filmsApplied Physics Letters, 1985
- Deposition of Ta2O5 Thin Film and Application to SAW Devices.Japanese Journal of Applied Physics, 1985
- Sputtered Ta2O5 antireflection coatings for silicon solar cellsThin Solid Films, 1982