Preparation of indium tin oxide films and doped tin oxide films by an ultrasonic spray CVD process
- 1 March 2001
- journal article
- Published by Elsevier BV in Applied Surface Science
- Vol. 172 (3-4), 245-252
- https://doi.org/10.1016/s0169-4332(00)00862-x
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablationThin Solid Films, 1999
- Reactive pulsed laser ablation and deposition of thin indium tin oxide films for solid state compact sensorsApplied Surface Science, 1999
- Structural studies of ITO thin films with the Rietveld methodThin Solid Films, 1998
- Characterizations of SnO2 thin films deposited on Si substratesThin Solid Films, 1998
- Preparation of tin oxide monolith by the sol-gel method from inorganic saltJournal of Materials Science, 1996
- Analysis of the effects of substrate temperature, concentration of tin chloride and nature of dopants on the structural and electrical properties of sprayed SnO2 filmsJournal of Materials Science, 1994
- Dependence of Photovoltages of Spray‐Deposited Indium Tin Oxide/Silicon Oxide/Silicon Junction Solar Cells on Spray SolventsJournal of the Electrochemical Society, 1994
- Photovoltaic properties of sprayed In2O3InP junctionsMaterials Science and Engineering B, 1992
- Characterization of fluorine-doped SnO2 films prepared by chemical vapour depositionThin Solid Films, 1985
- Sprayed films of indium tin oxide and fluorine-doped tin oxide of large surface areaThin Solid Films, 1981