Over 95% of large-scale length uniformity in template-assisted electrodeposited nanowires by subzero-temperature electrodeposition
Open Access
- 23 July 2011
- journal article
- research article
- Published by Springer Science and Business Media LLC in Nanoscale Research Letters
- Vol. 6 (1), 467
- https://doi.org/10.1186/1556-276x-6-467
Abstract
In this work, we report highly uniform growth of template-assisted electrodeposited copper nanowires on a large area by lowering the deposition temperature down to subzero centigrade. Even with highly disordered commercial porous anodic aluminum oxide template and conventional potentiostatic electrodeposition, length uniformity over 95% can be achieved when the deposition temperature is lowered down to -2.4°C. Decreased diffusion coefficient and ion concentration gradient due to the lowered deposition temperature effectively reduces ion diffusion rate, thereby favors uniform nanowire growth. Moreover, by varying the deposition temperature, we show that also the pore nucleation and the crystallinity can be controlled.Keywords
This publication has 35 references indexed in Scilit:
- Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large areaNanoscale Research Letters, 2011
- Nanostructured Copper Interfaces for Enhanced BoilingSmall, 2008
- Lithographically patterned nanowire electrodepositionNature Materials, 2006
- Fabrication Method for Thermoelectric NanodevicesAdvanced Materials, 2005
- Electrochemical synthesis and magnetoresistance properties of Ni, Co and Co/Cu nanowires in a nanoporous anodic oxide layer on metallic aluminiumJournal of Materials Chemistry, 2003
- Electrochemical Growth of Single-Crystal Metal Nanowires via a Two-Dimensional Nucleation and Growth MechanismNano Letters, 2003
- A Novel Method for Preparing Copper Nanorods and NanowiresAdvanced Materials, 2003
- Electrochemical synthesis of copper nanowiresJournal of Physics: Condensed Matter, 2001
- Structural investigations of thin films of copper–selenide electrodeposited at elevated temperaturesElectrochimica Acta, 1998
- Effect of temperature on the diffusion current and the thickness of the diffusion layerRussian Chemical Bulletin, 1956