Deep ultraviolet resists AZ DX-561 and AZ DX-1300P applied for electron beam and masked ion beam lithography
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6), 2550-2554
- https://doi.org/10.1116/1.589683
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Chemically amplified deep UV resists for micromachiningProceedings of SPIE, 1996
- Masked ion beam lithography for proximity printingMicroelectronic Engineering, 1996
- E-beam and RIE examination of chemically amplified positive-tone resist CAMP6Microelectronic Engineering, 1995
- Reactive ion etching for microelectrical mechanical system fabricationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Evaluation of commercial and experimental resist materials for use in MEBES mask makingPublished by SPIE-Intl Soc Optical Eng ,1995