High-energy lasing of XeBr in an electric discharge

Abstract

Using an electric discharge as the excitation source we have overcome the problem of Xe⁺₂ absorption and have observed lasing at 282 nm in XeBr at the 60‐mJ/pulse level. HBr is used as the halogen donor. Simultaneous laser oscillation at 291 nm in Br₂ has also been observed. The present laser, however, has materials compatibility problems causing short static‐fill lifetimes.