Tantalum ions produced by 1064 nm pulsed laser irradiation
- 1 April 2002
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 91 (7), 4685-4692
- https://doi.org/10.1063/1.1446660
Abstract
A -switched Nd:YAG (yttrium aluminum garnet) laser (1064 nm wavelength) with a 9 ns pulse width, 1–900 mJ pulse energy, and target spot, is employed to irradiate tantalum targets in vacuum. The irradiation produces a strong etching of the metal and forms a plasma in front of the target. The plasma contains neutrals and ions with a high charge state and a wide energy distribution. Time-of-flight measurements are presented for the ionic production. A cylindrical electrostatic ion analyzer permits to measure the yield and the charge state of the emitted ions and to extrapolate the ion energy distribution as a function of the laser fluence in the range The measurements indicate that at high laser fluence the tantalum charge state may reach and the maximum ion energy about 6 keV. The ion energy distribution is presented as a function of the charge state. It follows approximately a “shifted Maxwellian distribution.” A better theoretical approach has been further developed considering the Coulomb interactions occurring inside the plasma, which produce ion acceleration at velocities comparable with thermal ones, according to the so-called “shifted Maxwellian-Coulombian distribution.”
Keywords
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