Preparation of Tungsten Nitride Film by CVD Method Using WF 6

Abstract
Tungsten nitride film has been prepared by chemical vapor deposition using tungsten hexafluoride , ammonium , and hydrogen gas . film with metallic luster is obtained at 450°–600°C in the molar ratio of . Crystallite size of increases with increasing temperature from 450° to 650°C. SEM observation indicates that the size of particles in the film increases according to the change in crystallite size. ESCA spectra show that W‒N bond of has an ionic character, Wδ+ ‐ Nδ−.