Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge
- 21 November 2005
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 200 (5-6), 1855-1861
- https://doi.org/10.1016/j.surfcoat.2005.08.010
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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