Fabrication of Co2MnAl Heusler Alloy Epitaxial Film Using Cr Buffer Layer
- 1 September 2005
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 44 (9R)
- https://doi.org/10.1143/jjap.44.6535
Abstract
Thin films of the full-Heusler compound, Co2MnAl, were grown on Cr-buffered MgO(001) substrates at different growth temperature and post-annealing temperature by magnetron sputtering. Atomic force microscopy (AFM) and X-ray diffraction (XRD) measurements show that Cr-buffer layer can largely improve the surface morphology and structural quality of Co2MnAl film. The (001)-oriented epitaxial growth and B2 structure were confirmed by XRD measurements for all prepared samples. The smallest surface roughness (∼2 Å) and an identical M s value to the bulk value were obtained in the sample which was deposited at ambient temperature and post-annealed at 300°C.Keywords
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