Improvement of thickness distribution and crystallinity of ZnO thin films prepared by radio frequency planer magnetron sputtering
- 1 December 1998
- journal article
- Published by Elsevier BV in Vacuum
- Vol. 51 (4), 565-569
- https://doi.org/10.1016/s0042-207x(98)00254-1
Abstract
No abstract availableKeywords
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- Film thickness distribution in magnetron sputteringVacuum, 1988
- Effects of substrate orientation and rotation on internal stresses in sputtered metal filmsJournal of Vacuum Science and Technology, 1979
- Highly-oriented ZnO films by rf sputtering of hemispherical electrode systemJournal of Applied Physics, 1976
- Variation ofc-Axis Orientation of ZnO Thin Films Deposited by DC Diode SputteringJapanese Journal of Applied Physics, 1973