Self-annealing characterization of electroplated copper films
- 1 January 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 50 (1-4), 449-457
- https://doi.org/10.1016/s0167-9317(99)00314-7
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Recovery and recrystallization of electrodeposited bright copper coatings at room temperature. I. Microhardness in relation to coating structureJournal of Applied Electrochemistry, 1985