Investigation of the adhesive strength of PMMA structures on substrates obtained by deep X-ray lithography
- 31 January 1996
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 30 (1-4), 215-218
- https://doi.org/10.1016/0167-9317(95)00230-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Radiation effects of an electron beam on the microhardness of poly(methyl methacrylate): Poly(chlorotrifluoroethylene) polyblendsPolymer International, 1994
- Monte Carlo modeling of the photo and Auger electron production in X-ray lithography with synchrotron radiationIEEE Transactions on Electron Devices, 1985