An overview of the modified chemical vapor deposition (MCVD) process and performance
- 1 April 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 18 (4), 459-476
- https://doi.org/10.1109/jqe.1982.1071596
Abstract
This paper reviews the MCVD process, with special emphasis on fiber design and material choices, understanding of mechanisms involved in the process, process improvements, and performance.Keywords
This publication has 95 references indexed in Scilit:
- Profile dispersion characteristics in high-bandwidth graded-index optical fibersApplied Optics, 1980
- Thermophoresis: The mass transfer mechanism in modified chemical vapor depositionJournal of Applied Physics, 1979
- Pulse delay measurements in the zero-material-dispersion region for germanium- and phosphorus-doped silica fibresElectronics Letters, 1978
- Fabrication of graded-index fibers without an index dip by chemical vapor deposition methodApplied Physics Letters, 1977
- Water impurity in low-loss silica fibreMaterials Research Bulletin, 1977
- A new graphical method relating to optical fiber attenuationOptics Communications, 1976
- Drawing-induced coloration in vitreous silica fibersJournal of the Optical Society of America, 1974
- New silica-based low-loss optical fibreElectronics Letters, 1974
- Borosilicate glasses for fiber optical waveguidesMaterials Research Bulletin, 1973
- Interspecimen Comparison of the Refractive Index of Fused Silica*,†Journal of the Optical Society of America, 1965