High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser
- 1 March 2003
- journal article
- Published by Springer Science and Business Media LLC in Applied Physics B Laser and Optics
- Vol. 76 (3), 277-284
- https://doi.org/10.1007/s00340-002-1088-0