Ion-beam modification of TiO2 film to multilayered photocatalyst
- 1 January 1999
- journal article
- Published by Elsevier BV in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 148 (1-4), 758-761
- https://doi.org/10.1016/s0168-583x(98)00809-x
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Screen printed titanium oxide and PECVD silicon nitride as antireflection coating on silicon solar cellsRenewable Energy, 1997
- Phase development in sputter deposited titanium dioxideJournal of Vacuum Science & Technology A, 1996
- The effects of 6 keV Ar+ ion bombardment on the surface composition of simple and complex titanium oxidesVacuum, 1995
- Structural Changes of Titanium Oxide Induced by Chromium Addition as Determined by an X-Ray Diffraction StudyJournal of Solid State Chemistry, 1995
- TiO2 Thin Films Formed by Electron Cyclotron Resonance Plasma Oxidation at High Temperature and Their Application to Capacitor DielectricsJapanese Journal of Applied Physics, 1994
- A structural investigation of titanium dioxide photocatalystsJournal of Solid State Chemistry, 1991
- Compositional changes induced by 3.5 keV Ar+ ion bombardment in Ni-Ti oxide systemsSurface Science, 1989
- Determination of the thickness and optical constants of amorphous siliconJournal of Physics E: Scientific Instruments, 1983
- Quantitative Analysis of Anatase-Rutile Mixtures with an X-Ray DiffractometerAnalytical Chemistry, 1957