Residual stress and thermal expansion behavior of TaOxNy films by the micro-cantilever method
- 17 December 2001
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 401 (1-2), 291-297
- https://doi.org/10.1016/s0040-6090(01)01626-1
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Characteristics of tantalum oxynitride films prepared by rf magnetron sputteringPublished by SPIE-Intl Soc Optical Eng ,2000
- Organic thermal and electrostatic ciliary microactuator array for object manipulationSensors and Actuators A: Physical, 1997
- Determining mean and gradient residual stresses in thin films using micromachined cantileversJournal of Micromechanics and Microengineering, 1996
- Micromachined valve with hydraulically, actuated membrane, subsequent to a thermoelectrically controlled bimorph cantileverSensors and Actuators A: Physical, 1993
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992
- Influence of surface coatings on elasticity, residual stresses, and fracture properties of silicon microelementsJournal of Applied Physics, 1989
- The microstructure of sputter‐deposited coatingsJournal of Vacuum Science & Technology A, 1986
- Analysis of Bi-Metal ThermostatsJournal of the Optical Society of America, 1925