Ion bombardment fabrication of optical waveguides using electron resist masks

Abstract

Fabrication of a circular strip waveguide by ion implantation of fused silica through a mask made by electron‐beam exposure of polymethylmethacrylate (PMMA) is described. This technique has an advantage in its simplicity and the small number of processing steps involved. Guidance of 0.6328‐μm light from a He–Ne laser through the guide is demonstrated.