Plasma chemical vapor deposition of TiN
- 1 September 1984
- journal article
- Published by Springer Science and Business Media LLC in Plasma Chemistry and Plasma Processing
- Vol. 4 (3), 147-161
- https://doi.org/10.1007/bf00566838
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−xThin Solid Films, 1981
- Titanium nitride deposition in an r.f. dischargeJournal of the Less Common Metals, 1980
- Glow Discharge PolymerizationPublished by Elsevier BV ,1978
- Partial pressure of TiCl4 in CVD of TiNJournal of Vacuum Science and Technology, 1974
- Chemischer transport im nichtisothermen plasma; bildung von ain- und tin-kristallenJournal of Crystal Growth, 1971