Defects in sputter-deposited aluminium films, studied by X-ray diffraction and positron annihilation
- 15 August 1995
- journal article
- Published by Elsevier BV in Scripta Metallurgica et Materialia
- Vol. 33 (4), 575-581
- https://doi.org/10.1016/0956-716x(95)00287-6
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Topography and microstructure of Al films formed under various deposition conditionsJournal of Vacuum Science & Technology A, 1991
- The effect of the interfacial strength on the mechanical properties of aluminum filmsThin Solid Films, 1990
- Reflectivity of sputtered aluminum alloy filmsThin Solid Films, 1988
- Mechanical behavior of aluminum and Al-Cu(2%) thin filmsThin Solid Films, 1988
- Positron lifetime study of vacancy defects in non- stoichiometric TiNx and TiCx filmsThin Solid Films, 1988
- Lattice vacancies in TiN and HfN films: A study by positron annihilationThin Solid Films, 1987
- Positron profiles and positron annihilation in thin layersphysica status solidi (a), 1982
- The temperature dependence of stresses in aluminum films on oxidized silicon substratesThin Solid Films, 1978
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Positron trapping at defects in evaporated filmsApplied Physics A, 1974