The erbium-impurity interaction and its effects on the 1.54 μm luminescence of Er3+ in crystalline silicon
- 15 September 1995
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 78 (6), 3874-3882
- https://doi.org/10.1063/1.359904
Abstract
We have studied the effect of erbium‐impurity interactions on the 1.54 μm luminescence of Er3+ in crystalline Si. Float‐zone and Czochralski‐grown (100) oriented Si wafers were implanted with Er at a total dose of ∼1×1015/cm2. Some samples were also coimplanted with O, C, and F to realize uniform concentrations (up to 1020/cm3) of these impurities in the Er‐doped region. Samples were analyzed by photoluminescence spectroscopy (PL) and electron paramagnetic resonance (EPR). Deep‐level transient spectroscopy (DLTS) was also performed on p‐n diodes implanted with Er at a dose of 6×1011/cm2 and codoped with impurities at a constant concentration of 1×1018/cm3. It was found that impurity codoping reduces the temperature quenching of the PL yield and that this reduction is more marked when the impurity concentration is increased. An EPR spectrum of sharp, anisotropic, lines is obtained for the sample codoped with 1020 O/cm3 but no clear EPR signal is observed without this codoping. The spectrum for the magnetic field B parallel to the [100] direction is similar to that expected for Er3+ in an approximately octahedral crystal field. DLTS analyses confirmed the formation of new Er3+ sites in the presence of the codoping impurities. In particular, a reduction in the density of the deepest levels has been observed and an impurity+Er‐related level at ∼0.15 eV below the conduction band has been identified. This level is present in Er+O‐, Er+F‐, and Er+C‐doped Si samples while it is not observed in samples solely doped with Er or with the codoping impurity only. We suggest that this new level causes efficient excitation of Er through the recombination of e‐h pairs bound to this level. Temperature quenching is ascribed to the thermalization of bound electrons to the conduction band. We show that the attainment of well‐defined impurity‐related luminescent Er centers is responsible for both the luminescence enhancement at low temperatures and for the reduction of the temperature quenching of the luminescence. A quantitative model for the excitation and deexcitation processes of Er in Si is also proposed and shows good agreement with the experimental results.Keywords
This publication has 32 references indexed in Scilit:
- Temperature dependence and quenching processes of the intra-4fluminescence of Er in crystalline SiPhysical Review B, 1994
- Room-temperature sharp line electroluminescence at λ=1.54 μm from an erbium-doped, silicon light-emitting diodeApplied Physics Letters, 1994
- Room-temperature luminescence from Er-implanted semi-insulating polycrystalline siliconApplied Physics Letters, 1993
- Erbium point defects in siliconPhysical Review B, 1993
- The mechanisms of electronic excitation of rare earth impurities in semiconductorsSemiconductor Science and Technology, 1993
- Erbium Implantation in Silicon: A Way Towards Si-Based OptoelectronicsMRS Proceedings, 1993
- Electrically Pumped Rare Earth Doped Semiconductor LasersMRS Proceedings, 1993
- C Implantation for Suppression of Dislocation FormationMRS Proceedings, 1991
- Optical Activation of Er3+ Implanted in Silicon by Oxygen ImpuritiesJapanese Journal of Applied Physics, 1990
- Electron spin resonance of erbium in gallium arsenideJournal of Physics C: Solid State Physics, 1987