Thin buried oxide in implanted silicon
- 1 January 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 80-81, 813-817
- https://doi.org/10.1016/0168-583x(93)90688-3
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Historical overview of SIMOXVacuum, 1991
- PridolianPublished by Springer Nature ,1989
- A model for damage release in ion-implanted siliconJournal of Applied Physics, 1988
- Silicon amorphization during ion implantation as a thermal phenomenonPhysical Review B, 1987