PREFERRED ORIENTATION IN BIAS-SPUTTERED NICKEL CHROMIUM FILMS
- 1 December 1968
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 13 (11), 381-384
- https://doi.org/10.1063/1.1652480
Abstract
It is shown that substrate bias during dc sputtering effectively reduces oxygen contamination in nichrome films. This in turn leads to an enhancement of the preferred orientation of the deposits. Moreover, it appears that substrate bias plays an additional role in film orientation which is related to the initial nucleation and growth conditions.Keywords
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