Evidence for universal quantum reflection of hydrogen from liquid
- 6 September 1993
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 71 (10), 1589-1592
- https://doi.org/10.1103/physrevlett.71.1589
Abstract
Measurements of the sticking probability s(T) for H on bulk liquid reveal the onset of the universal √T dependence expected at very low atom temperatures. Studies of s(T) as a function of film thickness clearly demonstrate the influence of the van der Waals–Casimir force due to the substrate, in agreement with recent theories.
Keywords
This publication has 16 references indexed in Scilit:
- Quantum theory of stickingPhysical Review B, 1992
- Influence of the substrate on the low-temperature limit of the sticking probability of hydrogen atoms on He filmsPhysical Review B, 1992
- H atom sticking to He and He filmsPhysical Review Letters, 1992
- Hydrogen in the submillikelvin regime: Sticking probability on superfluidPhysical Review Letters, 1991
- Evidence for quantum sticking of slow positroniumPhysical Review Letters, 1991
- Thermal accommodation of spin-polarized hydrogen on liquid-He surfaces below 0.25 KPhysical Review B, 1990
- Critical-like behavior in quantum adsorptionPhysical Review B, 1989
- Vanishing Sticking Probabilities and Enhanced Capillary Flow of Spin-Polarized HydrogenPhysical Review Letters, 1986
- On the possibility of attaining the Bose-condensation region in spin-polarized atomic hydrogen at ultra-low temperaturesPhysics Letters A, 1983
- The interaction of atoms and molecules with solid surfaces III—The condensation and evaporation of atoms and moleculesProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1936