Decomposition Pathways for a Model TiN Chemical Vapor Deposition Precursor
- 1 January 1996
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 8 (1), 189-196
- https://doi.org/10.1021/cm950314z
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Small molecule elimination from Group IVB (titanium, zirconium, hafnium) amido complexesJournal of the American Chemical Society, 1993
- Methane activation by Group IVB imido complexesJournal of the American Chemical Society, 1992
- Infrared Studies of the Surface and Gas Phase Reactions Leading to the Growth of Titanium Nitride Thin Films from Tetrakis(dimethylamido)titanium and AmmoniaJournal of the Electrochemical Society, 1992
- Transition metal imido complexesJournal of the American Chemical Society, 1992
- Carbon-carbon double-bond formation in the intermolecular acetonitrile reductive coupling promoted by a mononuclear titanium(II) compound. Preparation and characterization of two titanium(IV) imido derivativesInorganic Chemistry, 1991
- Generation, alkyne cycloaddition, arene carbon-hydrogen activation, nitrogen-hydrogen activation and dative ligand trapping reactions of the first monomeric imidozirconocene (Cp2Zr:NR) complexesJournal of the American Chemical Society, 1988
- Monomeric metal hydroxides, alkoxides, and amides of the late transition metals: synthesis, reactions, and thermochemistryChemical Reviews, 1988
- Hydrogen-hydrogen and carbon-hydrogen activation reactions at d0 metal centersJournal of the American Chemical Society, 1986
- Homogeneous models for propylene ammoxidation. 1. Tungsten(VI) imido complexes as models for the active sitesJournal of the American Chemical Society, 1985
- Note on an Approximation Treatment for Many-Electron SystemsPhysical Review B, 1934