Abstract
The effects of (a) diffuse plasmon scattering and (b) the presence of surface layers such as oxide or contamination films on the measurement of electron absorption parameters are investigated. It is found that both (a) and (b) lower the contrast observed at thickness fringes and stacking faults. It is also shown that (a) and (b) cause the anomalous absorption coefficient to show a dependence on the objective aperture angle used to form the electron microscope image.

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