Investigation of the reactions of SiCl4 and O2 at elevated temperatures by infra-red spectroscopy
- 1 August 1978
- journal article
- Published by Springer Nature in Journal of Materials Science
- Vol. 13 (8), 1761-1768
- https://doi.org/10.1007/bf00548739
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- A new technique for the preparation of low-loss and graded-index optical fibersProceedings of the IEEE, 1974
- Schwingungsspektren und kraftkonstanten von halogendisilanenSpectrochimica Acta Part A: Molecular Spectroscopy, 1970
- Hexachlorodisiloxane: vibrational spectrum and structureSpectrochimica Acta Part A: Molecular Spectroscopy, 1969
- Hexachlorodisilane: vibrational spectrum, structure and internal rotationSpectrochimica Acta Part A: Molecular Spectroscopy, 1969
- Vibrational spectra and structure of some silicon-containing compounds. II. HexachlorodisiloxaneInorganic Chemistry, 1969
- 982. Chlorosiloxanes from the reaction between oxygen and silicon tetrachlorideJournal of the Chemical Society, 1960
- A New Series of Silicon Oxychlorides1Journal of the American Chemical Society, 1954
- The Raman Spectrum of HexachlorodisilaneThe Journal of Chemical Physics, 1950
- The Analysis of the Raman Spectra of Si2Cl6(l) and of Si2H6(g)The Journal of Chemical Physics, 1937
- THE RAMAN SPECTRUM OF GERMANIUM TETRACHLORIDEJournal of the American Chemical Society, 1932