THE RESISTIVITY OF EPITAXIAL FILMS OF SILVER WITH CONTROLLED SURFACE ROUGHNESS

Abstract
The resistivity of epitaxial silver films on mica in vacuum is studied as a function of temperature, thickness, and surface specularity on a sequence of samples having a common silver‐mica interface. Surface roughness is controlled by low‐temperature evaporation of very thin silver overlays. Typical size effect behavior is obtained, but the resistivity variation with temperature is less than in bulk and decreases for thinner films and rougher surfaces. Interpretation in terms of a Fuchs‐Sondheimer model requires temperature‐dependent specularity parameters.

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