InGaP/GaAs/InGaAs inverted metamorphic (IMM) solar cells on 4″ epitaxial lifted off (ELO) wafers
- 1 June 2010
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 002125-002128
- https://doi.org/10.1109/pvsc.2010.5616004
Abstract
InGaP/GaAs/InGaAs inverted metamorphic (IMM) triple junction (TJ) solar cells were fabricated on epitaxial liftoff (ELO) 100 mm diameter GaAs wafers. These ELO IMM solar cells exhibited an efficiency of 30% at one sun AM1.5D illumination, which is the highest reported efficiency for IMM ELO thin cells to date. The TJ ELO cells had fill factor (FF) >85%, open circuit voltage (Voc) of 2.78V, and short circuit current density (Jsc) of 12.64 mA/cm 2 . IMM ELO cells exhibited a peak efficiency of 36.3% at concentration of 264suns.Keywords
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