Vacuum ultraviolet laser emission from Nd+3:LaF3
- 1 January 1985
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 46 (1), 14-16
- https://doi.org/10.1063/1.95833
Abstract
Laser emission at 172 nm has been produced by pumping a Nd:LaF3 crystal with incoherent Kr*2 radiation at 146 nm. The 5‐ns pulse contained approximately 20–30 μJ of energy. Fluorescence measurements indicate potential for tuning from 170–175 nm, which should be observable with OH−‐free crystals.Keywords
This publication has 12 references indexed in Scilit:
- Dynamics of localized excitations from energy and time resolved spectroscopyApplied Optics, 1980
- Frequency mixing in the extreme ultravioletApplied Optics, 1980
- Optically pumped Ce:LaF_3 laser at 286 nmOptics Letters, 1980
- Ultraviolet solid-state Ce:YLF laser at 325 nmOptics Letters, 1979
- The possibilities of pumping UV lasers by synchrotron radiationNuclear Instruments and Methods, 1978
- VUV fluorescence of Nd3+-, Er3+, and Tm3+-doped trifluorides and tunable coherent sources from 1650 to 2600 ÅApplied Physics Letters, 1976
- The optical absorption of Br-ions in NaF single crystalsPhysica Status Solidi (a), 1975
- The optical absorption of Cl− ions in NaF single crystalsPhysica Status Solidi (a), 1975
- Stimulated emission in the vacuum ultraviolet regionSoviet Journal of Quantum Electronics, 1971
- The temperature dependence of the short wavelength transmittance limit of vacuum ultraviolet window materials—I. ExperimentJournal of Physics and Chemistry of Solids, 1969