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Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: III
Home
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Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: III
Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: III
CC
Chris Constantine
Chris Constantine
RW
Russell J. Westerman
Russell J. Westerman
JP
Jason Plumhoff
Jason Plumhoff
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22 January 2001
proceedings article
Published by
SPIE-Intl Soc Optical Eng
p.
85-96
https://doi.org/10.1117/12.410745
Abstract
No abstract available
Keywords
PHOTOMASKS
PLASMAS
Cited by 2 articles