In-situ thin film diagnostics using waveguide mode spectroscopy
- 1 April 2002
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 409 (2), 185-193
- https://doi.org/10.1016/s0040-6090(02)00128-1
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- In situ single wavelength ellipsometry studies of high rate hydrogenated amorphous silicon growth using a remote expanding thermal plasmaJournal of Applied Physics, 2000
- The chemistry of deposits formed from acrylic acid plasmasJournal of Materials Chemistry, 1998
- Real-Time Measurement of Thin Film Thickness During Plasma ProcessingPlasmas and Polymers, 1997
- Radiofrequency-induced plasma polymerisation of propenoic acid and propanoic acidJournal of the Chemical Society, Faraday Transactions, 1995
- Oxidation of polyethylene surfaces by remote plasma discharge: A comparison study with alternative oxidation methodsJournal of Polymer Science Part A: Polymer Chemistry, 1990
- The physics of plasma polymer depositionJournal of Applied Polymer Science, 1990
- Comparative Discharge Diagnostic Study of Silane, Disilane, and Germane RF Discharges Using Optical Emission Spectroscopy and Mass SpectrometryMRS Proceedings, 1988
- Production of argon metastable atoms in high pressure (20-300 Torr) microwave dischargesRevue de Physique Appliquée, 1988
- Experimental study of a d.c. oxygen glow discharge by V.U.V. absorption spectroscopyPlasma Chemistry and Plasma Processing, 1987
- A laboratory study on the dissociative recombination of vibrationally excited O2+ ionsJournal of Geophysical Research, 1980