Comparative Study of Plasma Anodization of Silicon in a Column of a dc Glow Discharge
- 15 September 1971
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 19 (6), 199-201
- https://doi.org/10.1063/1.1653882
Abstract
A comparative study of plasma anodization of silicon in the column of a dc oxygen glow discharge is presented. Quantitative results for growth rates of silicon dioxide in the negative glow, Faraday dark space, positive column, and the anode fall are given. It is observed that the growth rate is higher in the positive column than the other regions of the discharge.Keywords
This publication has 2 references indexed in Scilit:
- Effects of Specimen Size and Configuration in Plasma AnodizationJournal of the Electrochemical Society, 1970
- The Formation of Metal Oxide Films Using Gaseous and Solid ElectrolytesJournal of the Electrochemical Society, 1963