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The impact of high-sensitivity resist materials on x-ray lithography
Home
Publications
The impact of high-sensitivity resist materials on x-ray lithography
The impact of high-sensitivity resist materials on x-ray lithography
DS
Daniel Seligson
Daniel Seligson
HI
Hiroshi Ito
Hiroshi Ito
CW
C. Grant Willson
C. Grant Willson
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1 November 1988
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 6
(6)
,
2268-2273
https://doi.org/10.1116/1.584068
Abstract
No abstract available
Cited by 9 articles