Electron-hole pair production at metal surfaces
- 15 February 1985
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 31 (4), 1863-1872
- https://doi.org/10.1103/physrevb.31.1863
Abstract
We discuss the response of a metal surface to an external electric field which varies slowly in space and time. An earlier calculation of the power absorption due to the creation of electron-hole pairs is improved with the inclusion of an interference term between ‘‘bulk’’ and ‘‘surface’’ excitation processes. With these improvements, we obtain excellent agreement with the measured inelastic-electron-scattering cross section for Cu(100).Keywords
This publication has 22 references indexed in Scilit:
- Reference-plane position for the atom-surface van der Waals interactionPhysical Review B, 1984
- Dynamical processes at surfaces: Excitation of electron-hole pairsPhysical Review B, 1984
- Dynamical Density Response Function of a Metal Film in the Random-Phase ApproximationPhysical Review Letters, 1983
- Long-Range Scattering of Electrons by Electron-Hole Pair Excitations at Metal SurfacesPhysical Review Letters, 1983
- Sum rules for surface response functions with application to the van der Waals interaction between an atom and a metalPhysical Review B, 1983
- Local field at an irradiated adatom on jellium—exact microscopic resultsPhysical Review B, 1980
- Microscopic calculation of electromagnetic fields in refraction at a jellium-vacuum interfacePhysical Review B, 1975
- Microscopic calculation of surface-plasmon dispersion and dampingPhysical Review B, 1974
- Theory of Metal Surfaces: Induced Surface Charge and Image PotentialPhysical Review B, 1973
- Theory of Metal Surfaces: Charge Density and Surface EnergyPhysical Review B, 1970