Electron Microprobe Analysis of Ion-Implanted CdS

Abstract
An electron beam microprobe was utilized to study the depth distribution of ion‐implanted bismuth in CdS. The results, shown as a plot of relative Bi concentration vs depth, indicate that the bismuth concentration profile is of the type exp(−x/λ). Furthermore, the microprobe data reveal substantially deeper ion penetrations than predicted by LSS range theory.