Optimized depth resolution in ion-sputtered and lapped compositional profiles with Auger electron spectroscopy
- 1 January 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 75 (1), 67-86
- https://doi.org/10.1016/0040-6090(81)90393-x
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
- Ion beam texturing of surfacesJournal of Vacuum Science and Technology, 1979
- The structure and topographical modification of surfaces during depth profilingThin Solid Films, 1979
- The depth resolution of sputter profilingApplied Physics A, 1979
- The development of surface topography during depth profiling in auger electron spectroscopySurface Science, 1979
- Depth resolution in sputter profiling: Evidence against the sequential layer sputtering modelThin Solid Films, 1978
- Raster scanning depth profiling of layer structuresApplied Physics A, 1977
- Electron-beam effects in depth profiling measurements with Auger electron spectroscopyJournal of Applied Physics, 1975
- Secondary−ion mass spectrometry and its use in depth profilingJournal of Vacuum Science and Technology, 1975
- The growth of topography during sputtering of amorphous solidsJournal of Materials Science, 1973
- Die Analyse monomolekularer FestkörperoberflÄchenschichten mit Hilfe der SekundÄrionenemissionThe European Physical Journal A, 1970