Partial Order of the Quasiliquid During Surface Melting of Al(110)
- 20 January 1997
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 78 (3), 491-494
- https://doi.org/10.1103/physrevlett.78.491
Abstract
Polarization-dependent surface-extended x-ray-absorption fine-structure measurements have been performed on Al(110) and Al(111) at temperatures from 100 K up to the melting point . Surface melting has been observed on Al(110) above about 800 K by analyzing the Debye-Waller factor which is anisotropic at these temperatures. It is shown that the residual order of the quasiliquid during surface melting consists of intact rows or segments of them which have liquidlike mobilities.
Keywords
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