Partial Order of the Quasiliquid During Surface Melting of Al(110)

Abstract
Polarization-dependent surface-extended x-ray-absorption fine-structure measurements have been performed on Al(110) and Al(111) at temperatures from 100 K up to the melting point (Tm=933.5K). Surface melting has been observed on Al(110) above about 800 K by analyzing the Debye-Waller factor which is anisotropic at these temperatures. It is shown that the residual order of the quasiliquid during surface melting consists of intact [11¯0] rows or segments of them which have liquidlike mobilities.