"GT target", A new high rate sputtering target of magnetic materials
- 1 November 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 18 (6), 1080-1082
- https://doi.org/10.1109/tmag.1982.1062177
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixturesJournal of Vacuum Science and Technology, 1980