Ellipsometry measurements of nickel silicides
- 15 March 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 59 (6), 2165-2167
- https://doi.org/10.1063/1.337025
Abstract
[[abstract]]The real (n) and imaginary (k) parts of the refraction index of Ni2Si, NiSi, and NiSi2 silicides are measured by an ellipsometer in the optical range of 4000–7000 Å. The n and k are within the values of 2.0–3.5 for the high-temperature annealed nickel silicides.[[fileno]]2010122010036[[department]]物理Keywords
This publication has 3 references indexed in Scilit:
- Infrared optical constants of PtSiApplied Physics Letters, 1983
- Infrared absorption of thin metal films: Pt on SiApplied Physics Letters, 1983
- Sequence of phase formation in planar metal-Si reaction couplesApplied Physics Letters, 1981